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Photolithography to form microcontact printing tools


EMSL Project ID
2354

Abstract

Objectives are to use the photolithography facility in EMSL 1304 clean room to form patterned resists on silicon wafers.

Project Details

Project type
Exploratory Research
Start Date
2001-09-25
End Date
2002-06-30
Status
Closed

Team

Principal Investigator

Barbara Tarasevich
Institution
Pacific Northwest National Laboratory