Photolithography to form microcontact printing tools
EMSL Project ID
2354
Abstract
Objectives are to use the photolithography facility in EMSL 1304 clean room to form patterned resists on silicon wafers.
Project Details
Project type
Exploratory Research
Start Date
2001-09-25
End Date
2002-06-30
Status
Closed
Released Data Link
Team
Principal Investigator