Influencing passivity breakdown resistance of ultra-thin oxides on Al-Ni-Cu alloy surfaces through photo-excitation
EMSL Project ID
39194
Abstract
We will investigate the nano-scale passive oxide formation on the effects of Ni addition to Al-Cu alloy thin films against the corrosive environments by XPS, RBS, and NRA facilities. This is a very important and unique system since Cu oxide formation is non-uniform and 2-D growth mediated. We would like to explore how photo-excitation affects the oxide stoichiometry and resulting corrosion resistance. To the best of our knowledge, such studies have not been performed earlier. We believe the unique and well integrated ion scattering equipments can help and provide us a deeper insight of nature of nano-scale oxide films.This work is crucial to the PhD dissertation defense of Chia-Lin Chang who has been closely collaborating with EMSL scientists Dr. Mark Engelhard and Dr. V. Shutthanandan. Chia-Lin has to defend his dissertation by April ’10 and hence we request this rapid proposal be approved. In recent past, Chia-Lin’s collaboration with EMSL scientists has led to numerous publications in journals such as Physical Review and Applied Physics Letters. This final piece of work from this planned research will likely also lead to publications in high-impact journals.
Project Details
Project type
Limited Scope
Start Date
2010-04-06
End Date
2010-06-06
Status
Closed
Released Data Link
Team
Principal Investigator
Team Members
Related Publications
Chang CL, MH Engelhard, and S Ramanathan. 2010. "Mechanistic Studies on Room Temperature Photoexcitation Effects on Passivity Breakdown of Ultrathin Surface Oxide Films Formed on Ternary Al-5%Cu-5%Ni Alloys." Journal of Physical Chemistry C 114:17788–17795. doi:10.1021/jp106297c