Characterization of sputter deposited Co doped TiO2 films
EMSL Project ID
6910
Abstract
Sputter deposited Co:TiO2 films are of interest as part of the joint NSF Oxide Spintronics project between UW and PNNL. The films were sputtered onto LaAlO3 substrates, and have shown enhanced ferromagnetic behavior at room temperature upon annealing. It is the focus of my current research to determine if the increased moment/Co atom is due to clustering of the Co atoms in the films, or whether there is a uniform distribution throughout the film. Characterization methods I would like to use for my samples are TEM and RBS, with the goals of determining the clustering/uniformity of Co on samples both as-deposited and after a high vacuum anneal (via TEM imaging), and atomic % Co as a function of film depth (via RBS).
Project Details
Project type
Exploratory Research
Start Date
2004-02-02
End Date
2006-04-13
Status
Closed
Released Data Link
Team
Principal Investigator
Team Members