ATM, ISO and other standard and metrology measurements for surface analysis
EMSL Project ID
8221
Abstract
This activity involves extended that state of the art in surface analysis by expanding the understanding of equipment capability, testing new approaches to instrument calibration and operation, and understanding the limitations of measurement methods. Activities include measurements of electron and x-ray photon damage, developing methods control charge in XPS and AES, understanding impacts and details of probe measurements.
Project Details
Project type
Exploratory Research
Start Date
2004-04-20
End Date
2007-06-03
Status
Closed
Released Data Link
Team
Principal Investigator
Team Members
Related Publications
XPS guide: Charge neutralization and binding energy referencing for insulating samples
Baer D.R., K. Artyushkova, H. Cohen, C.D. Easton, M.H. Engelhard, T.R. Gengenbach, and G. Greczynski, et al. 2020. "XPS Guide: Charge neutralization and binding energy referencing for insulating samples." Journal of Vacuum Science and Technology A--Vacuum, Surfaces and Films 38, no. 3:031204. PNNL-SA-151014. doi:10.1116/6.0000057
Role of consistent terminology in XPS reproducibility
Baer D.R., and A.G. Shard. 2020. "Role of consistent terminology in XPS reproducibility." Journal of Vacuum Science and Technology A--Vacuum, Surfaces and Films 38, no. 3:031203. PNNL-SA-150698. doi:10.1116/6.0000016
Importance of sample preparation on reliable surface characterisation of nano-objects: ISO standard 20579-4
Baer D.R., A.S. Karakoti, C.A. Clifford, C. Minelli, and W.E. Unger. 2018. "Importance of sample preparation on reliable surface characterisation of nano-objects: ISO Standard 20579-4." Surface and Interface Analysis 50, no. 9:902-906. PNNL-SA-135106. doi:10.1002/sia.6490
Comparison of the sputter rates of oxide films relative to the sputter rate of SiO2
Baer DR, MH Engelhard, AS Lea, P Nachimuthu, T Droubay, J Kim, B Lee, C Mathews, RL Opila, LV Saraf, WF Stickle, R Wallace, and BS Wright. 2010. "Comparison of the Sputter Rates of Oxide Films Relative to the Sputter Rate of SiO2." Journal of Vacuum Science and Technology A--Vacuum, Surfaces and Films 28(5):1060-1072. doi:10.1116/1.3456123
XPS analysis of nanostructured materials and biological surfaces
Baer DR, and MH Engelhard. 2010. "XPS Analysis of Nanostructured Materials and Biological Surfaces." Journal of Electron Spectroscopy and Related Phenomena 178-179:415-432. doi:10.1016/j.elspec.2009.09.003