The use of FESEM
EMSL Project ID
18000
Abstract
It is the intent of this proposal to apply for the access of FESEM. FESEM will be used to characterize the grain size, film thickness and surface morphology of thin films, which are fabricated at the High Temperature Electrochemistry Center (HiTEC) in Materials Science Division of Energy Science and Technology Directorate. Typical the film thickness is in the range from 50 to 1000nm and grain size is between 4 and 500nm. The characteristic dimension in the nanometer region necessitates the use of FESEM to gain an improved resolution. In addition, FESEM will be utilized to characterize nanocrystalline powders and layered structures, which will be developed at HiTEC.
Project Details
Project type
Exploratory Research
Start Date
2006-02-20
End Date
2007-01-19
Status
Closed
Released Data Link
Team
Principal Investigator