Development of Wet Chemical Etching Methods to Create Chalcogenide Glass Film Structures
EMSL Project ID
18192
Abstract
We propose the development of wet chemical etching methods to etch chalcogenide glass film structures for the telecommunications applications. We plan to use EMSL micro-fabrication facility for chemical etching of chalcogenides such as As2S3, As2Se3 with the help of NaOH and NH3OH solutions. Patternes of chalcogenide glass film structures will be created with the help of photo-lithography and chromium sputtering will be utilized in order to use it as an etching mask. We will examine the surface etching conditons with the help of optical profilometer.
Project Details
Project type
Exploratory Research
Start Date
2006-02-27
End Date
2007-03-22
Status
Closed
Released Data Link
Team
Principal Investigator