Growth of Ti-doped Epitaxial alpha-Fe2O3(0001) Thin Films

EMSL Project ID

27093

Award DOI

https://dx.doi.org/10.46936/genr.proj.2007.27093/60003674

Abstract

We propose to grow epitaxial Ti:alpha-Fe2O3 thin films (200 Å thick) with low Ti concentrations (2% and 4%) and to apply the X-ray standing wave (XSW) imaging method to obtain the atomic-scale structural details.
Study of Ti-doped alpha-Fe2O3 serves two purposes. First, atomic-scale distribution of the Ti dopant including the occupational fraction will greatly aid in the understanding magnetic and electronic properties of films. Second, the system can be used for development of anomalous XSW method.

Project Details

Project type

Exploratory Research

Start Date

2007-09-04

End Date

2008-09-07

Status

Closed

Released Data Link

https://search.emsl.pnnl.gov/?project_id_search=27093

Team

Principal Investigator

Chang-Yong Kim

Institution

Canadian Light Source Inc.

Related Publications

Kim CY. 2011. "X-ray Microdiffraction from ?-Ti0.04Fe1.96O3 (0001) Epitaxial Film Grown Over ?-Cr2O3 Buffer Layer Boundary." Thin Solid Films 519(18):5996-5999 . doi:10.1016/j.tsf.2011.03.130

https://dx.doi.org/10.1016/j.tsf.2011.03.130