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Development of Tunable Highly Efficient THz Sources using Focused Ion Beam (FIB)-Based Lithography


EMSL Project ID
30498

Abstract

The present proposal addresses this specific problem of availability of narrow line width cw source by designing, creating, and testing novel structures on semiconductor material surfaces for enhanced THz generation. Our approach consists of increasing interaction lengths with collinear interaction of THz and optical waves by microstructuring a semiconductor surface using an advanced processing (e.g., focused ion beam (FIB)) tool to control and tune the THz generation. This research will potentially lead to breakthroughs in fundamental semiconductor surface/interface science that will help advance the understanding of several physical/chemical/biological processes in THz regime and also develop more advanced THz spectroscopy capability in the future.

Project Details

Project type
Large-Scale EMSL Research
Start Date
2008-08-01
End Date
2009-09-30
Status
Closed

Team

Principal Investigator

S Sundaram
Institution
Alfred University

Team Members

Laxmikant Saraf
Institution
Clemson University

Brian Riley
Institution
Pacific Northwest National Laboratory

Jarrod Crum
Institution
Pacific Northwest National Laboratory