Fabricate Nanoscale Thin Film Cathode with Sputter Deposition
EMSL Project ID
3533
Abstract
The objective of this project is 1) to fabricate nanoscale thin film cathode with sputtering and pulsed laser deposition techniques with well defined electrode geometry, 2) study transient electrode response using improved microelectrode arrays design that allow unambiguous accurate measurement of the working electrode response and 3) develop mechanistic models for electrode reactions that link electrode response directly to materials properties and interface geometry, using finite element methods.Project Details
Project type
Exploratory Research
Start Date
2003-05-06
End Date
2004-06-17
Status
Closed
Released Data Link
Team
Principal Investigator
Team Members