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Surface cleanliness of Si wafer after laser treatment


EMSL Project ID
8991

Abstract

The samples are silicon coupons (1cm square or smaller) that were laser irradiated. This process is supposed to remove hydrocarbon contaminants essentially and leave behind a clean Si surface.
Simple XPS acquisitions of C 1s and Si 2p and quantification of these two elements provide sufficent information about the cleanliness of the surface. I would like to analyze 37 samples and convert the data files into Vamas format. The analysis should not take more than 4 hours in addition of the pumping time.

Project Details

Project type
Exploratory Research
Start Date
2004-05-19
End Date
2006-04-13
Status
Closed

Team

Principal Investigator

Louis Scudiero
Institution
Washington State University