Skip to main content

Characterization of sputtered ZnO films


EMSL Project ID
1624

Abstract

We are sputtering films of ZnO with a RF magnetron system, and wish to characterize the thickness uniformity and grain size. Mr. Dunham has suggested the use of an optical profilometer to characterize the thickness distribution, and SEM examination to determine grain size. We would like to provide appropriate samples to Mr. Dunham and work with him to carry out these measureements.

Project Details

Project type
Exploratory Research
Start Date
1999-06-25
End Date
2000-09-30
Status
Closed

Team

Principal Investigator

Larry Olsen
Institution
Pacific Northwest National Laboratory