Deposition and characterization of high-k dielectric thin films
EMSL Project ID
1770
Abstract
Processing and characterization of high-k dielectric thin films for ULSI applications. Dielectrics such as TiO2, Ta2O5, ZrO2 will be studied via insitu AES, XPS, LEED.
Project Details
Project type
Exploratory Research
Start Date
1999-12-27
End Date
2002-03-31
Status
Closed
Released Data Link
Team
Principal Investigator
Team Members