Development of a Scalable Solution-based Catalyst Fabrication Process using Microreaction Technology
EMSL Project ID
25704
Abstract
Nanoscale heterogeneous catalysts require structural control over several scales of dimensions. A rigorous approach is to use a combination of physical vapor deposition (e.g. molecular beam epitaxy, sputtering) and patterning techniques (e.g. e-beam lithography and photolithography) that are commonly used in the microelectronics industry1. It is a powerful approach that is ideal for producing model systems. This approach is, however, expensive for large scale catalyst production. Further, many gas phase catalytic reactions are limited by mass and heat transfer rather than by reaction kinetics. The current practice of heterogeneous catalyst preparation, thus, relies heavily on solution chemistry. The reaction kinetics of molecular precursors in most solution systems is fast with multiple pathways. The highly complex hierarchical structures of typical heterogeneous catalysts have rendered the catalyst manufacturing processes difficult to control and scale up. The objective of this project is to develop a scalable and high-throughput solution-based catalyst fabrication process, including metal oxides and metals, using microreaction technology that offers much more precise control over the kinetic boundary conditions than conventional catalyst manufacturing processes. It is requetsed for access of several EMSL's tools including HREM, SEM, NMR, SPM and XPS for detailed interfacial and structural charactrizations of the nanocatalysts.
Project Details
Project type
Large-Scale EMSL Research
Start Date
2007-06-09
End Date
2008-06-15
Status
Closed
Released Data Link
Team
Principal Investigator
Team Members
Related Publications
Han S, DH Lee, SO Ryu, and C Chang. 2010. "ZnS Thin Films Deposited by a Spin Successive Ionic Layer Adsorption and Reaction Process." Electrochemical and Solid-State Letters 13(8):D61-D64. doi:10.1149/1.342874