Fundamental understanding of atomic force microscope-induced nanoscale interfacial reactions through nanostructure characterization
EMSL Project ID
35998
Abstract
The proposed research focuses on the fundamental understanding of the chemical reactions occurring at the nanoscale tip-sample interface during atomic force microscope (AFM) lithography. This understanding requires a detailed characterization of the nanostructures manufactured using different lithography conditions and parameters. In particular, we will focus on features produced with either high field liquid precursor direct write or local anodic oxidation. The proposed research at EMSL would focus on (1) compositional characterization, (2) bonding characterization, and (3) nanostructural characterization. The goal of this research is to understand the mechanisms involved in the fabrication of features within this complex multi-interfacial environment and to enable careful tailoring of processing parameters. This will afford the facile manufacturing of a broad range of nanostructures with several potential applications such as: nanotransistors, multiplexed chemical and biological sensors, nanoscale waveguides, and memory devices. Because of the very small size of the features deposited via AFM lithography (2-3 nm height, 10-50 nm width per line), we must look outside our home institution to the EMSL facility for the instrumentation required for nanoscale characterization.
Project Details
Project type
Exploratory Research
Start Date
2009-10-16
End Date
2010-10-17
Status
Closed
Released Data Link
Team
Principal Investigator
Related Publications
Torrey JD, SE Vasko, A Kapetanovic, Z Zhu, A Scholl, and M Rolandi. 2010. "Scanning Probe Direct-Write of Germanium Nanostructures." Advanced Materials 22(41):4639–4642. doi:10.1002/adma.201001987